Selected Publications & PDF Links (January 2011)

349.    P.T. Blanchard, K.A. Bertness, T.E. Harvey, A.W. Sanders, N.A. Sanford, S.M. George, D. Seghete, "MOSFETs Made from GaN Nanowires with Fully Conformal Cylindrical Gates", IEEE Trans. Nanotechnology 11, 479-482 (2012).

345.    W. Wang, M. Tian, A.I. Abdulagatov, S.M. George, Y.C. Lee and R.G. Yang, "Three-Dimensional N/TiO2 Nanowire Network for High Areal Capacity Lithium-Ion Microbattery Applications", Nano Letters 12, 655-660 (2012).

344.    S.M. George, B. Yoon, R.A. Hall, A.I. Abdulagatov, Z.M. Gibbs, Y. Lee, D. Seghete and B.H. Lee, "Molecular Layer Deposition of Hybrid Organic-Inorganic Films", Chapter 5 inAtomic Layer Deposition of Nanostructured Materials, edited by N. Pinna and M Knez (Wiley-VCH, Weinheim, Germany, 2012).

343.    Xiang Sun, Ming Xie, Gongkai Wang, Hongtao Sun, Andrew Cavanagh, Jonathan Travis, Steven George and Jie Lian, "Atomic Layer Deposition of TiO2 on Graphene for Supercapacitors", J. Electrochem. Soc. 159, A364-A369 (2012).

342. Paul Poodt, David C. Cameron, Eric Dickey, Steven M. George, Vladimir Kuznetsov, Gregory N. Parsons, Fred Roozeboom, Ganesh Sundaram and Ad Vermeer, "Spatial Atomic Layer Deposition: A RouteTowards Further Industrialization of ALD" J. Vac. Sci. Technol. A30, 010802 (2012).

341. P. Ryan Fitzpatrick, Zachary M. Gibbs and Steven M. George, "Evaluating Operating Conditions for Continuous Atmospheric Atomic Layer Deposition using a Multiple Slit Gas Source Head", J. Vac. Sci. Technol. A 30, 01A136 (2012).

340. Byoung H. Lee, Byunghoon Yoon, Virginia R. Anderson and Steven M. George, "Alucone Alloys with Tunable Properties Using Alucone Molecular Layer Deposition and Al2O3 Atomic Layer Deposition", J. Phys. Chem. C116, 3250-3257 (2012).

337.    Yoon Seok Jung, Andrew S. Cavanagh, Yanfa Yan, Steven M. George and Arumugam Manthiram, "Effects of Atomic Layer Deposition of Al2O3 on the Li[Li0.20Mn0.54Ni0.13Co0.13]O2 Cathode of Lithium-Ion Batteries", J. Electrochem. Soc. 158, A1298-A1302 (2011).

336.    A.I. Abdulagatov, Y. Yan, J.R Cooper, Y. Zhang, Z.M. Gibbs, A.S. Cavanagh, R.G. Yang, Y.C. Lee and S.M. George, "Al2O3 and TiO2 Atomic Layer Deposition on Copper for Water Corrosion Resistance", ACS Appl. Mater. Interfaces 3, 4593-4601 (2011).

335. Y. Zhang, R.G. Yang, S.M. George and Y.C. Lee, "In-Situ Inspection of Cracking in Atomic-Layer-Deposited Barrier Films on Surface and in Buried Structures", Thin Solid Films520, 251-257 (2011). 

334. B. H. Lee, V. R. Anderson and S. M. George, "Metalcone and Metalcone/Metal Oxide Alloys Grown Using Atomic & Molecular Layer Deposition", ECS Transactions 41(2) 131-138 (2011).

333.  B. Yoon, B. H. Lee and S. M. George, "Molecular Layer Deposition of Flexible, Transparent and Conductive Hybrid Organic-Inorganic Thin Films", ECS Transactions 41 (2) 271-277 (2011).

332.    Gregory N. Parsons, Steven M. George and Mato Knez, "Progress and Future Directions for Atomic Layer Deposition and ALD-based Chemistry", MRS Bulletin 36,865-871 (2011).

331. Y. Lee, B. Yoon, A.S. Cavanagh and S.M. George, "Molecular Layer Deposition of Aluminum Alkoxide Polymer Films Using Trimethylaluminum and Glycidol", Langmuir 27, 15155-15164 (2011).

330.    S.M. George, B.H. Lee, B. Yoon, A.I. Abdulagatov and R.A. Hall, "Metalcones:Hybrid Organic-Inorganic Films Fabricated Using Atomic & Molecular LayerDepositionTechniques", J. Nanoscience & Nanotechnology 11, 7948-7955 (2011).

329.    S.M. George, P.R. Fitzpatrick and Z.M. Gibbs, "Atomic Layer Deposition for Continuous Roll-to-Roll Processing", Summer Bulletin of the Society of Vacuum Coaters (SVC), pages 50-54 (2011).

328. S.M. George, P.R. Fitzpatrick and Z.M. Gibbs, "Atomic Layer Deposition for Continuous Roll-to-Roll Processing", 54th Technical Conference Proceedings of the Society of Vacuum Coaters (SVC), 76-81 (2011).

327. J.A. Bertrand and S.M. George, "Atomic Layer Deposition on Polymers for Ultralow Water Vapor Transmission Rates:  The Ca Test", 54th Technical Conference Proceedings of the Society of Vacuum Coaters (SVC), 492-496 (2011).

326. B.D. Davidson, D. Seghete, S.M. George and V.M. Bright, "ALD Tungsten NEMS Switches and Tunneling Devices", Sensors & Actuators A 166, 269-276 (2011).

325. L.A. Riley, S.V. Atta, A.S. Cavanagh, Y. Yan, S.M. George, P. Liu, A.C. Dillon and S.H. Lee, "Electrochemical Effects of ALD Surface Modification on Combustion Synthesized LiNi1/3Mn1/3Co1/3O2 as a Layered Cathode Material", J. Power Sources 196, 3317-3324 (2011).

324. S.M. George, "Hybrid Organic-Inorganic Films Grown Using Molecular Layer Deposition",The Strem Chemiker, Vol. XXV, No. 1, March 2011 (Strem Chemicals, Inc., Newburyport, Massachusetts) pp. 13-26.

323. E. Kang, Y.S. Jung, A.S. Cavanagh, G.H. Kim, S.M. George, A.C. Dillon, J.K. Kim and J. Lee, "Fe3O4 Nanoparticles Confined in Mesocellular Carbon Foam for High Performance Anode Materials for Lithium-Ion Batteries", Adv. Funct. Mater. 21, 2430-2438 (2011).

322. A.C. Dillon, L.A. Riley, Y.S. Jung, C. Ban, D. Molina, A.H. Mahan, A.S. Cavanagh, S.M. George and S.-H. Lee, "HWCVD MoO3 Nanoparticles and a-Si for Next Generation Li-Ion Anodes", Thin Solid Films 519, 4495-4497 (2011).

321. K. Leung, Y. Qi, K.R. Zavadil, Y.S. Jung, A.C. Dillon, A.S. Cavanagh; S.H. Lee, S.M. George, "Using Atomic Layer Deposition to Hinder Solvent Decomposition in Lithium Ion Batteries: First Principles Modeling and Experimental Studies", J. Am. Chem. Soc. 133, 14741-14754 (2011).

320.  S.H. Jen, J.A. Bertrand and S.M. George, "Flexibility of Al2O3 Films Grown by Atomic Layer Deposition:  Critical Tensile and Compressive Strains for Cracking", Submitted toJournal of Applied Physics

319.  L. Baker, A.S. Cavanagh, D. Seghete, S.M. George, A.J.M. Mackus, W.M.M. Kessels, Z.Y. Liu and F.T. Wagner, "Nucleation and Growth of Pt Atomic Layer Deposition on Al2O3Substrates Using (Methylcyclopentadienyl)-Trimethyl Platinum and O2 Plasma", Journal of Applied Physics (In Press). 

318.  J.B. Schlager, K.A. Bertness, P.T. Blanchard, L.H. Robins, B.B. Burton, S.M. George and N.A. Sanford, "Photoluminescence from Relaxed and Strained GaN Nanowires Grown by Catalyst-free MBE", Submitted to Nano Letters

317.  D.N. Goldstein and S.M. George, "Surface Poisoning in the Nucleation and Growth of Palladium Atomic Layer Deposition with Pd(hfac)2 and Formalin", Thin Solid Films (In Press)

316.  D. Seghete, F.H. Fabreguette and S.M. George, "Using a Slit Doser to Probe Gas Dynamics during Al2O3 Atomic Layer Deposition and to Fabricate Laterally Graded Al2O3Layers", Thin Solid Films. (In Press)

315.  D. Seghete, G.B. Rayner, Jr., A.S. Cavanagh, V.R. Anderson and S.M. George, "Molybdenum Atomic Layer Deposition Using MoF6 and Si2H6 as Reactants", Submitted toChemistry of Materials (In Press).   

314.  L.A. Riley, A.S. Cavanagh, S.M. George, S.H. Lee and A.C. Dillon, "Improved Mechanical Integrity of ALD-Coated Composite Electrodes for Li-Ion Batteries",Electrochem. Solid-State Lett. 14, A29-A31 (2011).

313.  I.D. Scott, Y.S. Jung, A.S. Cavanagh, Y. Yan, A.C. Dillon, S.M. George, S.H. Lee, "Ultrathin Coatings on Nano-LiCoO2 for Li-Ion Vehicular Applications", Nano Letters 11, 414-418 (2011). 

312.  J.R. Montague, M. Dalberth, J.M. Grey, D. Seghete, K.A. Bertness, S.M. George, V.M. Bright, C.T. Rogers, N.A. Sanford, "Analysis of High-Q Gallium Nitride Resonators in Response to Deposited Thin Films", Sensors and Actuators A (In Press).

311.  J.H. Cheng, D. Seghete, M. Lee, J.B. Schlager, K.A. Bertness, N.A. Sanford, R. Yang, S.M. George and Y.C. Lee, "Atomic layer deposition enabled interconnect technology for vertical nanowire arraysSensors and Actuators A (In Press).

310.  D.C. Miller, R.R. Foster, S.H. Jen, J.A. Bertrand, S.J. Cunningham, A.S. Morris, Y.C. Lee, S.M. George and M.L. Dunn, "Thermo-mechanical Properties of Alumina Films Created Using the Atomic Layer Deposition Technique", Sensors and Actuators A 164, 58-67 (2010).

309.  L.A. Riley, A.S. Cavanagh, S.M. George, Y.S. Jung, Y. Yan, S.H. Lee and A.C. Dillon, "Conformal Surface Coatings to Enable High Volume Expansion Li-ion Anode Materials",ChemPhysChem11, 2124-2130 (2010).

308.  J.Y. Kim and S.M. George, "Tin Monosulfide Thin Films Grown by Atomic Layer Deposition Using Tin 2,4-Pentanedionate and Hydrogen Sulfide, J. Phys. Chem. C 114, 17597-17603 (2010)

307.  S.K. Sarkar, J.Y. Kim, D.N. Goldstein, N.R. Neale, K. Zhu, C.M. Elliott, A.J. Frank and S.M. George, "In2S3 Atomic Layer Deposition and Its Application as a Sensitizer on TiO2Nanotube Arrays for Solar Energy Conversion", J. Phys. Chem. C 114, 8032-8039 (2010). 

306.  T.K. Minton, B. Wu, J. Zhang, N.F. Lindholm, A.I. Abdulagatov, J.L. O'Patchen, S.M. George and M.D. Groner, "Protecting Polymers in Space with Atomic Layer Deposition Coatings", ACS Appl. Mater. Interfaces 2, 2515-2520 (2010).

305.  D.J. Guo, A.I. Abdulagatov, D.M. Rourke, K.A. Bertness, S.M. George, Y.C. Lee and W. Tan, "GaN Nanowire Functionalized with Atomic Layer Deposition Techniques for Enhanced Immobilization of Biomolecules", Langmuir 26, 18382-18391 (2010).

304.  A.S. Cavanagh, Y. Lee, B. Yoon and S.M. George, "Atomic Layer Deposition of LiOH and Li2CO3 Using Lithium t-butoxide as the Lithium Source", in Atomic Layer Deposition Applications 6, edited by A. Londergan, J.W. Elam, O. van der Straten, S. De Gendt, S.F. Bent and S.B. Kang (The Electrochemical Society, Pennington, NJ, 2010); also ECS Transactions33, 223-229 (2010).

303.  N.A. Sanford, P.T. Blanchard, K.A. Bertness, L. Mansfield, J.B. Schlager, A.W. Sanders, A. Roshko, B.B. Burton and S.M. George, "Steady-State and Transient Photoconductivity in c-axis GaN Nanowires Grown by Nitrogen-Plasma-Assisted Molecular Beam Epitaxy", J. Appl. Phys. 107, 034318 (2010).

302. D. Seghete, R.A. Hall, B. Yoon and S.M. George, "Importance of Trimethylaluminum Diffusion in Three-Step ABC Molecular Layer Deposition Using Trimethylaluminum, Ethanolamine and Maleic Anhydride", Langmuir 26, 19045-19051 (2010).

301.  Y.S. Jung, A.S. Cavanagh, A.C. Dillon, M.D. Groner, S.M. George and S.H. Lee, "Ultrathin Direct Atomic Layer Deposition on Composite Electrodes is Critical for Highly Durable and Safe Li-Ion Batteries ", Adv. Mater. 22, 2172-2176 (2010).

300.  S.M. George, "Atomic Layer Deposition:  An Overview", Chem. Rev. 110, 111-131 (2010).

299.  Y.S. Jung, A.S. Cavanagh, A.C. Dillon, M.D. Groner, S.M. George and S.H. Lee, "Enhanced Stability of LiCoO2 Cathodes in Lithium-ion Batteries Using Surface Modification by Atomic Layer Deposition", J. Electrochem. Soc. 157, A75-A81 (2010). 

298.  R.A. Wind and S.M. George, "Quartz Crystal Microbalance Studies of Al2O3 Atomic Layer Deposition Using Trimethylaluminum and Water at 125°C", J. Phys. Chem. A 114, 1281-1289 (2010).

297.  D.C. Miller, R.R. Foster, S.H. Jen, J.A. Bertrand, D. Seghete, B. Yoon, Y.C. Lee, S.M. George and M.L. Dunn, "Thermo-Mechanical Properties of Aluminum Alkoxide (Alucone) Films Created Using Molecular Layer Deposition", Acta Mater. 57, 5083-5092 (2009).

296.  D.C. Miller, R.R. Foster, Y. Zhang, S.H. Jen, J.A. Bertrand, Z. Lu, D. Seghete, J.L. O'Patchen, R. Yang, Y.C. Lee, S.M. George and M.L. Dunn, "The Mechanical Robustness of Atomic Layer- and Molecular Layer-Deposited Coatings on Polymer Substrates", J. Appl. Phys. 105, 093527 (2009).

295.  D.N. Goldstein and S.M. George, "Enhancing the Nucleation of Palladium Atomic Layer Deposition Using Trimethylaluminum to Prevent Surface Poisoning by Reaction Products",Appl. Phys. Lett. 95, 143106 (2009).

294.  G.B. Rayner, Jr. and S.M. George, "Nucleation and Growth of Tantalum Nitride Atomic Layer Deposition on Al2O3 Using TBTDET and Hydrogen Radicals", J. Vac. Sci. Technol. A 27, 716-724 (2009).

293.  Y.J. Chang, J.M. Gray, A. Imtiaz, D. Seghete, T.M. Wallis, S.M. George, P. Kabos, C.T. Rodgers and V.M. Bright, "Micromachined Resonators of High Q-Factor Based on Atomic Layer Deposited Alumina", Sens. Actuators A 154, 229-237 (2009).

292.  B. Yoon, J.L. O'Patchen, D. Seghete, A.S. Cavanagh and S.M. George, "Molecular Layer Deposition of Hybrid Organic-Inorganic Polymer Films Using Diethylzinc and Ethylene Glycol", Chem. Vap. Deposition 15, 112-121 (2009).

291.  R.A. Wind, F.H. Fabreguette, Z.A. Sechrist and S.M. George, "Nucleation Period, Surface Roughness and Oscillations in Mass Gain per Cycle during W Atomic Layer Deposition on Al2O3", J. Appl. Phys. 105, 074309 (2009).

290.  S.M. George, B. Yoon and A.A. Dameron, "Surface Chemistry for Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers", Acc. Chem. Res. 42, 498-508 (2009).

289.  B. Yoon, D. Seghete, A.S. Cavanagh and S.M. George, "Molecular Layer Deposition of Hybrid Organic-Inorganic Alucone Polymer Films Using a Three-Step ABC Reaction Sequence", Chem. Mater. 21, 5365-5374 (2009). 

288.  Y. Zhang, Y.Z. Zhang, D.C. Miller, J.A. Bertrand, S.H. Jen, R. Yang, M.L. Dunn, S.M. George and Y. C. Lee, "Fluorescent Tags to Visualize Defects in Al2O3 Thin Films Grown Using Atomic Layer Deposition", Thin Solid Films 517, 6794-6797 (2009).

287.  Y. Zhang, J.A. Bertrand, R. Yang, S.M. George and Y. C. Lee, "Electroplating to Visualize Defects in Al2O3 Thin Films Grown Using Atomic Layer Deposition", Thin Solid Films517, 3269-3272 (2009).

286.  P. F. Carcia, R.S. McLean, M. D. Groner, A. A. Dameron and S. M. George, Al2O3 ALD and SiN PECVD Films as Gas Diffusion Ultra-barrier on Polymer Substrates, J. Appl. Phys.106, 023533 (2009).

285.  B.B. Burton, F.H. Fabreguette and S.M. George, "Atomic Layer Deposition of MnO Using Bis(ethylcyclopentadienyl)manganese and H2O", Thin Solid Films 517, 5658-5665 (2009).

284.  B. B. Burton, S. W. Kang, S.W. Rhee and S.M. George, "SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in situ Transmission FTIR Spectroscopy", J. Phys. Chem. C 113, 8249-8257 (2009).

283.  A.S. Cavanagh, C.A. Wilson, A.W. Weimer and S.M. George, "Atomic Layer Deposition on Gram Quantities of Multiwalled Carbon Nanotubes", Nanotechnology 20, 255602 (2009).

282.  J.R. Scheffe, A. Francés, D.M. King, X. Liang, B.A. Branch, A.S. Cavanagh, S.M. George and A.W. Weimer, "Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen", Thin Solid Films 517, 1874–1879 (2009).

280.  B.B. Burton, D.N. Goldstein and S.M. George, "Atomic Layer Deposition of MgO Using Bis(ethylcyclopentadienyl)magnesium and H2O", J. Phys. Chem. C113, 1939-1946 (2009).

279.   X. Liang, P. Li, S.M. George and A.W. Weimer, "Nanocoating Hybrid Polymer Films on Large Quantities of Cohesive Nanoparticles by Molecular Layer Deposition", AIChE J. 55, 1030-1039 (2009).

278.  D.N. Goldstein, J.A. McCormick and S.M. George, "Al2O3 Atomic Layer Deposition using Trimethylaluminum and Ozone Studied by in situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry", J. Phys. Chem. C 112, 19530-19539 (2008).

276.  B.B. Burton, M.P. Boleslawski, A.T. Desombre and S.M. George, "Rapid SiO2 Atomic Layer Deposition Using Tris(tert-pentoxy)silanol", Chem. Mater. 20, 7031-7043 (2008).

275. S.M. George and B. Yoon, "Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers", In Material Matters, Vol. 3, No. 2, "Nanoscale Surface Modification" (Aldrich Chemical Co., Inc., Milwaukee, WI, 2008) pp. 34-37.

274. X. Du and S.M. George, "Thickness Dependence of Sensor Response for CO Gas Sensing by Tin Oxide Films Grown Using Atomic Layer Deposition", Sensors and Actuators B135, 152-160 (2008).

273.  X. Du, Y. Du and S.M. George, "CO Gas Sensing by Ultrathin Tin Oxide Films Grown by Atomic Layer Deposition Using Transmission FTIR Spectroscopy", J. Phys. Chem. A112, 9211-9219 (2008).

272.  A.A. Dameron, D. Seghete, B.B. Burton, S.D. Davidson, A.S. Cavanagh, J.A. Bertrand and S.M. George, "Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol", Chem. Mater.20, 3315-3326 (2008).

271.  X. Liang, D.M. King, M.D. Groner, J.H. Blackson, J.D. Harris, S.M. George and A.W. Weimer, "Barrier Properties of Polymer/Alumina Nanocomposite Membranes Fabricated by Atomic Layer Deposition", J. Membrane Sci.322, 105-112 (2008).

270.  B.B. Burton, A.R. Lavoie and S.M. George, "Tantalum Nitride Atomic Layer Deposition Using Tris(diethylamido)(tert-butylimido)tantalum and Hydrazine", J. Electrochem. Soc. 155, D508-D516 (2008).

269.  A.A. Dameron, S.D. Davidson, B.B. Burton, P.F. Carcia, R.S. McLean and S.M. George, "Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition", J. Phys. Chem. C112, 4573-4580 (2008).

268.  N.M. Adamczyk, A.A. Dameron and S.M. George, "Molecular Layer Deposition of Poly(p-phenylene terephthalamide) Films Using Terephthaloyl Chloride and p-Phenylenediamine",Langmuir24, 2081-2089 (2008).

267.  C.A. Wilson, D.N. Goldstein, J.A. McCormick, A.W. Weimer and S.M. George, "Tungsten Atomic Layer Deposition on Cobalt Nanoparticles", J. Vac. Sci. Technol. A26, 430-437 (2008).

265.  C.A. Wilson, J.A. McCormick, A.S. Cavanagh, D.N. Goldstein, A.W. Weimer and S.M. George, "Tungsten Atomic Layer Deposition on Polymers", Thin Solid Films516, 6175-6185 (2008).

264.  M.A. Weimer, M.D. Groner, L.F. Hakim, D.M. King, X. Liang, P. Li, S.M. George and A.W. Weimer, "Ultrafast Metal-Insulator Varistors Based Tunable Al2O3 Tunnel Junctions", Appl. Phys. Lett.92, 164101 (2008).

263.  X. Liang, G.D. Zhan, D.M. King, J.A. McCormick, J. Zhang, S.M. George and A.W. Weimer, "Alumina Atomic Layer Deposition Nanocoatings on Primary Diamond Particles in a Fluidized Bed Reactor", Diam. Relat. Mater.17, 185-189 (2008).

262.  D.S. Finch, T. Oreskovic, K. Ramadurai, C.F. Herrmann, S.M. George and R.L. Mahajan, "Biocompatibility of Atomic Layer-Deposited Alumina Thin Films", J. Biomed. Mater. Res. A 87A, 100-106 (2008).

261.  R. Cooper, H.P. Upadhyaya, T.K. Minton, M.R. Berman, X. Du and S.M. George, "Protection of Polymer from Atomic-Oxygen Erosion Using Al2O3 Atomic Layer Deposition Coatings", Thin Solid Films516, 4036-4039 (2008).

257.  X.H. Liang, S.M. George, A.W. Weimer, N.H. Li, J. Blackson, J. Harris and P. Li, "Synthesis of a Novel Porous Polymer/Ceramic Composite Material by Low-Temperature Atomic Layer Deposition", Chem. Mater.19, 5388-5394 (2007).

256.  Y. Du and S.M. George, "Molecular Layer Deposition of Nylon 66 Films Examined Using In Situ FTIR Spectroscopy" J. Phys. Chem. C111, 8509-8517 (2007).

255.  L.F. Hakim, D.M. King, Y. Zhou, C.J. Gump, S.M. George and A.W. Weimer, "Nanoparticle Coating for Advanced Optical, Mechanical and Rheological Properties," Adv. Funct. Mater. 17, 3175-3181 (2007).

254.  F.H. Fabreguette and S.M. George, "X-Ray Mirrors on Flexible Polymer Substrates Fabricated by Atomic Layer Deposition" Thin Solid Films515, 7177-7180 (2007).

253.  J.A. McCormick, K.P. Rice, D.F. Paul, A.W. Weimer and S.M. George, "Al2O3 Atomic Layer Deposition on ZrO2 Nanoparticles in a Rotary Reactor" Chem. Vapor Depos.13, 491-498 (2007).

252.  X.H. Liang, L.F. Hakim, G.D. Zhan, J.A. McCormick, S.M. George, A.W. Weimer, J.A. Spencer II, K.J. Buechler, J. Blackson, C.J. Wood and J.R. Dorgan,  "Polymer/Ceramic Nanocomposites Produced by Extruding ALD Nanocoated Polymer Particles,"  J. Am Ceram. Soc.90, 57-63 (2007).

251.  J.A. McCormick, B.L. Cloutier, A.W. Weimer and S.M. George, "Rotary Reactor for Atomic Layer Deposition on Large Quantities of Nanoparticles", J. Vac. Sci. Technol. A 25, 67-74 (2007).

250.  Y. Du, X. Du and S. M. George, "Mechanism of Pyridine-Catalyzed SiO2 Atomic Layer Deposition Studied by Fourier Transform Infrared Spectroscopy", J. Phys. Chem. C 111, 219-226 (2007).

249.  D.C. Miller, C.F. Herrmann, H.J. Maier, S.M. George, C.R. Stoldt and K. Gall, "Thermo-Mechanical Evolution of Multilayer Thin Films, Part II:  Microstructure Evolution in Au/Cr/Si Microcantilevers", Thin Solid Films515, 3224-3240 (2007).

248.  D.C. Miller, C.F. Herrmann, H.J. Maier, S.M. George, C.R. Stoldt and K. Gall, "Thermo-Mechanical Evolution of Multilayer Thin Films, Part I:  Mechanical Behavior of Au/Cr/Si Microcantilevers", Thin Solid Films515, 3208-3223 (2007).

247.  C.F. Herrmann, F. W. DelRio, D.C. Miller, S.M. George, V.M. Bright, J.L. Ebel, R.E. Strawser, R Cortez and K.D. Leedy, "Alternative Dielectric Films for RF MEMS Capacitive Switches Deposited Using Atomic Layer Deposited Al2O3/ZnO Alloys", Sensors and Actuators A135, 262-272 (2007).

246.  L.F. Hakim, J.A. McCormick, G.D. Zhan, A.W. Weimer, P. Li and S.M. George, "Surface Modification of Titania Nanoparticles Using Ultrathin Ceramic Films", J. Am. Ceram. Soc.89, 3070-3075 (2006).

245.  M.K. Tripp, C. Stampfer, D.C. Miller, T. Helbling, C.F. Herrmann, C. Hierold, K. Gall, S.M. George and V.M. Bright, "The Mechanical Properties of Atomic Layer Deposited Alumina for Use in Micro- and Nano-Electromechanical Systems", Sensors and Actuators A130-131, 419-429 (2006).

244.  P.F. Carcia, R.S. McLean, M.H. Reilly, M.D. Groner and S.M. George, "Ca-Tests of Al2O3 Gas Diffusion Barriers Grown by Atomic Layer Deposition on Polymers", Appl. Phys. Lett.89, 031915 (2006).

243.  Z.A. Sechrist, B.T. Schwartz, J.H. Lee, J.A. McCormick, R. Piestun, W. Park, and S.M. George, "Modification of Opal Photonic Crystals Using Al2O3 Atomic Layer Deposition", Chem. Mater. 18, 3562-3570 (2006).

242.  R.K. Grubbs and S.M. George, "Attenuation of Hydrogen Radicals Traveling under Flowing Gas Conditions Through Tubes of Different Materials ", J. Vac. Sci. Technol. A 24, 486-496 (2006).

241.  M.D. Groner, S.M. George, R.S. McLean and P.F. Carcia, "Gas Diffusion Barriers on Polymers Using Al2O3 Atomic Layer Deposition", Appl. Phys. Lett.88, Art. No. 051907 (2006).

240. F.H. Fabreguette, R.W. Wind and S.M. George, "Ultra-high X-Ray Reflectivity from W/Al2O3 Multilayers Fabricated Using Atomic Layer Deposition", Appl. Phys. Lett.88, Art. No. 013116 (2006).

238.  L.F. Hakim, J. Blackson, S.M. George and A.W. Weimer, "Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor", Chem. Vap. Deposition11, 420-425 (2005).

237.  C.A. Wilson, R.K. Grubbs and S.M. George, "Nucleation and Growth during Al2O3 Atomic Layer Deposition on Polymers", Chem. Mater.17, 5625-5634 (2005).

236.  Z.A. Sechrist, F.H. Fabreguette, O. Heintz, T.M. Phung, D.C. Johnson and S.M. George, "Optimization and Structural Characterization of W/Al2O3 Nanolaminates Grown Using Atomic Layer Deposition Techniques", Chem. Mater.17, 3475-3485 (2005).

235.  J.D. Ferguson, K.J. Buechler, A.W. Weimer and S.M. George, "SnO2 Atomic Layer Deposition on ZrO2 and Al Nanoparticles:  Pathway to Enhanced Thermite Materials", Powder Technology156, 154-163 (2005).

234.  M.J. Pellin, P.C. Stair, G. Xiong, J.W. Elam, J. Birrell, L. Curtiss, S.M. George, C.Y. Han, L. Iton, H. Kung, M. Kung and H.H. Wang, "Mesoporous Catalytic Membranes:  Synthetic Control of Pore Size and Wall Composition", Catalysis Letters 102, 127-130 (2005).

233.  L.F. Hakim, S.M. George and A.W. Weimer, "Conformal Nanocoating of Primary Zirconia Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor", Nanotechnology 16, S375-S381 (2005).

232.  C.F. Herrmann, F.H. Fabreguette, D.S. Finch, R. Geiss and S.M. George, "Multilayer and Functional Coatings on Carbon Nanotubes Using Atomic Layer Deposition", Appl. Phys. Lett. 87, Art. No. 123110 (2005).

231.  D.C. Miller, C.F. Herrmann, H.J. Maier, S.M. George, C.R. Stoldt and K. Gall, "Intrinsic Stress Development and Microstructure Evolution of Au/Cr/Si Multilayer Thin Films Subject to Annealing", Scripta Materialia 52, 873-879 (2005).

230.  X. Du, Y. Du and S.M. George, "In Situ Examination of Tin Oxide Atomic Layer Deposition Using QCM and FTIR Techniques", J. Vac. Sci. Technol. A 23, 581-588 (2005).

229.  M.K. Tripp, F.H. Fabreguette, C.H. Herrmann, S.M. George and V.M. Bright, "Multilayer Coating Technique to Enhance X-Ray Reflectivity of Polysilicon Micro-Mirrors at 1.54 Å Wavelength", Proceedings of SPIE 5720, 241-251 (2005).

228.  C.F. Herrmann, F.W. DelRio, S.M. George and V.M. Bright, "Properties of Atomic Layer Deposited Al2O3/ZnO Dielectric Films Grown at Low Temperature for RF MEMS", Proceedings of SPIE 5715, 159-166 (2005).

227.  Y. Du, X. Du and S.M. George, "SiO2 Film Growth at Low Temperatures by Catalyzed Atomic Layer Deposition in a Viscous Flow Reactor", Thin Solid Films 491, 43-53 (2005).

226.  C.F. Herrmann, F.W. DelRio, V.M. Bright and S.M. George, "Conformal Hydrophobic Coatings Prepared Using Atomic Layer Deposition Seed Layers and Non-Chlorinated Hydrophobic Precursors", J. Micromech. Microeng. 15, 984-992 (2005).

225.  F.H. Fabreguette, Z.A. Sechrist, J.W. Elam and S.M. George, "Quartz Crystal Microbalance Study of Tungsten Atomic Layer Deposition using WF6 and Si2H6", Thin Solid Films 488, 103-110 (2005).

224.  J.D. Ferguson, A.W. Weimer and S.M. George, "Surface Chemistry and Infrared Absorbance Changes during ZnO Atomic Layer Deposition on ZrO2 and BaTiO3 Particles", J. Vac. Sci. Technol. A 23, 118-125 (2005).

223.  S.W. Kang, S.W. Rhee and S.M. George, "Infrared Spectroscopic Study of Atomic Layer Deposition (ALD) Mechanism for Hafnium Silicate Thin Films Using HfCl2[N(SiMe3)2] and H2O", J. Vac. Sci. Technol. A 22, 2392-2397 (2004).

222.  Y. Zhang, M.L. Dunn, K. Gall, J.W. Elam and S.M. George, "Suppression of Inelastic Deformation of Nanocoated Thin Film Microstructures", J. Appl. Phys. 95, 8216-8225 (2004).

221.  J.R. Wank, S.M. George and A.W. Weimer, "Nanocoating Individual Cohesive Boron Nitride Particles in a Fluidized Bed by ALD", Powder Technology 142, 59-69 (2004).

220.  J.R. Wank, S.M. George and A.W. Weimer, "Coating Fine Nickel Particles with Al2O3 Utilizing an Atomic Layer Deposition-Fluidized Bed Reactor (ALD-FBR)", J. Am. Ceramic Soc. 87, 762-765 (2004).

219.  J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of Al2O3 Films on Polyethylene Particles", Chem. Mater. 16, 5602-5609 (2004).

218.  R.M. Costescu, D.G. Cahill, F.H. Fabreguette, Z.A. Sechrist and S.M. George, "Preparation of Ultra-Low Thermal Conductivity W/Al2O3 Nanolaminates", Science 303, 989-990 (2004).

217.  R.K. Grubbs, N.J. Steinmetz and S.M. George, "Gas Phase Reaction Products during Tungsten Atomic Layer Deposition Using WF6 and Si2H6", J. Vac. Sci. Technol. B 22, 1811-1821 (2004).

216.  J.D. Ferguson, E.R. Smith, A.W. Weimer and S.M. George, "Atomic Layer Deposition of SiO2 at Room Temperature using TEOS and H2O with NH3 as the Catalyst", J. Electrochem. Soc. 151, G528-G535 (2004).

215.  M.D. Groner, F.H. Fabreguette, J.W. Elam and S.M. George, "Low Temperature Al2O3 Atomic Layer Deposition", Chem. Mater. 16, 639-645 (2004).

214.  R.K. Grubbs, J.W. Elam, C.E. Nelson and S.M. George, "Nucleation and Growth During Tungsten ALD on Al2O3 Surfaces and Al2O3 ALD on Tungsten Surfaces", Thin Solid Films 467, 16-27 (2004).

213.   J.D. Ferguson, A.R. Yoder, A.W. Weimer and S.M. George, "TiO2 Atomic Layer Deposition on ZrO2 Particles Using Alternating Exposures of TiCl4 and H2O", Appl. Surf. Sci. 226, 393-404 (2004).

212.  K. Gall, M. L. Dunn, M. Hulse, D. Finch and S. M. George, "Effect of Al2O3 Nanocoatings on the Thermo-Mechanical Behavior of Au/Si MEMS Structures", Conference Proceedings of the IEEE International Reliability Physics Symposium, Dallas, Texas, March 30-April 4, 2003, pp. 463-472.

211.  M.N. Rocklein and S.M. George, "Temperature-Induced Apparent Mass Changes Observed during Quartz Crystal Microbalance Measurements of Atomic Layer Deposition", Anal. Chem. 75, 4975-4982 (2003).

210.  J.W. Elam, D. Routkevitch, P.P. Markilovich and S.M. George, "Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition", Chem. Mater. 15, 3507-3517 (2003).

209.  M.D. Groner and S.M. George, "High-k Dielectrics Grown by Atomic Layer Deposition: Capacitor and Gate Applications" Chapter 10 in Interlayer Dielectrics for Semiconductor Technologies. S.P. Murarka, M. Eizenbert and A.K. Sinha, Eds., (Elsevier Academic Press, Amsterdam, 2003) pp. 327-348.

208.  T.M. Mayer, J.W. Elam, S.M. George and P.G. Kotula, "Atomic Layer Deposition of Wear-Resistant Coatings for Micromechanical Devices", Appl. Phys. Lett. 82, 2883-2885 (2003).

207.  J.W. Elam, C.A. Wilson, M.Schuisky, Z.A. Sechrist and S.M. George, "Improved Nucleation on TiN ALD Films on SiLK Low-k Polymer Dielectric Using an Al2O3 ALD Adhesion Layer", J. Vac. Sci. Technol. B 21, 1099-1107 (2003).

206.  J.W. Elam, M. Schuisky, J.D. Ferguson and S.M. George, "Surface Chemistry and Film Growth During TiN Atomic Layer Deposition using TDMAT and NH3", Thin Solid Films 436, 145-156 (2003).

204.  K. Gall, M. Hulse, M.L. Dunn, D. Finch, S.M. George and B.A. Corff, "Thermo-Mechanical Response of Bare and Al2O3 Nanocoated Au/Si Bilayer Beams for MEMS", J. Mater. Res. 18, 1575-1587 (2003).

203.  J.W. Elam, D. Routkevitch and S.M. George, "Properties of ZnO/Al2O3 Alloy Films Grown Using Atomic Layer Deposition Techniques", J. Electrochem. Soc. 150, G339-G347 (2003).

202.  J.W. Elam and S.M. George, "Growth of ZnO/Al2O3 Alloy Films Using Atomic Layer Deposition", Chem. Mater. 15, 1020-1028 (2003).

201.  N.D.Hoivik, J.W. Elam, R.J. Linderman, V.M. Bright, S.M. George and Y.C. Lee, "Atomic Layer Deposited Protective Coatings for Micro-Electromechanical Systems", Sensor Actuat. A103, 100-108 (2003).

197.  M. Schuisky, J.W. Elam and S.M. George, "In Situ Resistivity Measurements During the Atomic Layer Deposition of ZnO and W Thin Films", Appl. Phys. Lett. 81, 180-182 (2002).

196.  J.M. Jensen, A.B. Oelkers, R. Toivola, D.C. Johnson, J.W. Elam and S.M. George, "X-ray Reflectivity Characterization of ZnO/Al2O3 Multilayers Prepared Using Atomic Layer Deposition",Chem. Mater. 14, 2276-2282 (2002).

195.  M.D. Groner, J.W. Elam, F.H. Fabreguette and S.M. George, "Electrical Characterization of Thin Al2O3 Films Grown by Atomic Layer Deposition on Silicon and Various Metal Substrates",Thin Solid Films 413, 186-197 (2002).

194.  J.W. Elam, Z.A. Sechrist and S.M. George, "ZnO/Al2O3 Nanolaminates Fabricated by Atomic Layer Deposition: Growth and Surface Roughness Measurements", Thin Solid Films 414, 43-55 (2002).

193.  J.W. Elam, M.D. Groner and S.M. George, "Viscous Flow Reactor with Quartz Crystal Microbalance for Thin Film Growth by Atomic Layer Deposition", Rev. Sci. Instrum. 73, 2981-2987 (2002).

192.  J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of Boron Nitride Using Sequential Exposures of BCl3 and NH3", Thin Solid Films 413, 16-25 (2002).

185.  J.R. Wank, S.M. George and A.W. Weimer, "Vibro-fluidization of Fine Boron Nitride Powder at Low Pressure", Powder Technology 121, 195-204 (2001).

183.  J.W. Elam, C.E. Nelson, R.K. Grubbs and S.M. George, "Kinetics of the WF6 and Si2H6 Surface Reactions During Tungsten Atomic Layer Deposition", Surf. Sci. 479, 121-135 (2001).

182.  J.W. Elam, C.E. Nelson, R.K. Grubbs and S.M. George, "Nucleation and Growth During Tungsten Atomic Layer Deposition on SiO2 Surfaces", Thin Solid Films 386, 41-52 (2001).

177.  J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of SiO2 Films on BN Particles Using Sequential Surface Reactions", Chem. Mater. 12, 3472-3480 (2000).

176.  M.A. Cameron, I.P. Gartland, J.A. Smith, S.F. Diaz and S.M. George, "Atomic Layer Deposition of SiO2 and TiO2 in Alumina Tubular Membranes: Pore Reduction and Effect of Surface Species on Gas Transport", Langmuir 16, 7435-7444 (2000).

175.  J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of Ultrathin and Conformal Al2O3 Films on BN Particles", Thin Solid Films 371, 95-104 (2000).

173.  J.W. Klaus, S.J. Ferro and S.M. George, "Atomically Controlled Growth of Tungsten and Tungsten Nitride Using Sequential Surface Reactions", Appl. Surf. Sci. 162-163, 479-491 (2000).

172.  J.W. Klaus, S.J. Ferro and S.M. George, "Atomic Layer Deposition of Tungsten Using Sequential Surface Chemistry with a Sacrificial Stripping Reaction", Thin Solid Films 360, 145-153 (2000).

171.  J.W. Klaus and S.M. George, "SiO2 Chemical Vapor Deposition at Room Temperature Using SiCl4 + H2O with a NH3 Catalyst", J. Electrochem. Soc. 147, 2658-2664 (2000).

170.  J.W. Klaus and S.M. George, "Atomic Layer Deposition of SiO2 at Room Temperature Using NH3-Catalyzed Sequential Surface Reactions", Surf. Sci. 447, 81-90 (2000).

169.  J.W. Klaus, S.J. Ferro and S.M. George, "Atomic Layer Deposition of Tungsten Nitride Films Using Sequential Surface Reactions", J. Electrochem. Soc. 147, 1175-1181 (2000).

168.  J.D. Ferguson, A.W. Weimer and S.M. George, "Atomic Layer Deposition of Al2O3 and SiO2 on BN Particles Using Sequential Surface Reactions", Appl. Surf. Sci. 162-163, 280-292 (2000).

 

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